MECHANISM AND KINETICS OF THE OXIDATION PROCESS OF NH3, H2S AND CH4 IN THE PRESENCE OF SEMICONDUCTOR GAS SENSITIVE NANOCOMPOSITE METAL OXIDES.

Abstract

In the work, the laws of oxidation with metal oxides of hydrogen sulfide, ammonia, and methane were studied. The composition of the reaction products with the presence of highly active catalytic systems prepared on the basis of iron, titanium, copper, tungsten, and zinc oxides was investigated, and the mechanism of the oxidation process and optimal temperature ranges were proposed. On the basis of the obtained materials, gas-inert materials for competitive, selective semiconductor sensors of ammonia, hydrogen sulfide and methane were created and their performance was determined.